Such stochastic noise is present for all lithographic
processes but is more worrisome for
EUV lithography for several reasons: fewer photons per unit dose, since each
EUV …
Materials for MEMS manufacturing. The fabrication of MEMS evolved from the process technology in semiconductor device fabrication, i.e. the basic techniques are deposition of material layers, patterning by photolithography and etching to produce the required shapes.. Silicon. Silicon is the material used to create most integrated circuits used in consumer electronics in the modern industry.
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Elsa Reichmanis is a faculty member in the School of Chemical and Biomolecular Engineering of the Georgia Institute of Technology. Prior to joining Georgia Tech she was Bell Labs Fellow and Director of the
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